Figure 1(a) exhibited the Raman spectroscopy of ITTO samples, verifying the phase structure of the ceramic. Four characteristic peaks were observed, including B1g, Eg, A1g and the second-order effect in multi-phonon peak at 234 cm−1. As a result, the Raman peak which verify the existence of the rutile TiO2 crystal structure [16]. In terms of the Rietveld refinement, no distinct other phases were observed in ITTO samples in Figure 1(b). The lattice parameters (a = b = 4.614 Å and c = 2.980 Å) of the ITTO ceramics were achieved by Rietveld refinement are larger than ( a = b = 4.593, c = 2.959 (JCPDS 21-1276)) for pure rutile TiO2 [22]. As a result, the lattice size of the increase could be related to the Ta5+ and In3+ of larger ionic radii instead of the Ti4+ ions, indicating Ta5+ and In3+ form a complete solid solution in rutile TiO2 structure. Figure 1(c) exhibited the microstructure of hot-corrosion surface for the ITTO ceramics in detail, and dense sample, apparent grain and grain boundary were observed, no obvious impurity segregation and porosity, and Figure 1(d) exhibited the grain size almost 11.35 µm.
To reveal the dielectric properties in ITTO ceramics, Fig. 2(a) exhibited the frequency dependence of the dielectric loss and permittivity of the ITTO ceramics, which are 0.0072 and 1.18×105 at 1 kHz, respectively, including the good frequency and temperature stability. Meanwhile, Fig. 2(b) exhibited the temperature function of ITTO ceramics. The temperature coefficient of the sample is calculated between ± 3.3% at 1 kHz, which satisfies X9D (-100°C - 235°C, Δεr/ε25°C < ± 3.3%), and Fig. 2(c) exhibited between ± 4.7% at 10 kHz, which satisfies X9E (-60°C - 300°C, Δεr/ε25°C < ±4.7%) requirements, far below the practical applications requirements. As shown in Fig. 2(d), the typical CP materials have been contrasted in detail. As a result, the ultralow dielectric loss, ultrahigh permittivity with temperature stability were obtained in ITTO ceramics. [5–9, 11, 23, 24]
To elucidate the influences of Ta5+ and In3+ co-doped TiO2 structure in the sample on the potential dielectric mechanism. In Fig. 3, the XPS spectra of the ITTO ceramics were used to analyze the origin of CP, and different elements In, Ta, Ti, O were identified to the binding energies in the sample. Fig. 3(a) exhibited the binding energies (230.02 eV, 241.59 eV) of two peaks which confirmed the existence of Ta5+ [25]. Meanwhile, the binding energies (444.51 eV, 452.07 eV) of two peaks were assigned with the presence of In3+ in Fig. 3(b) [26].

(1)
Figure 3(c) exhibited the three energy peaks components of O1s profile, which can be confirmed as the bulk Ti-O bond (530.12 eV), oxygen vacancies (531.5 eV), and the surface hydroxyl (OH) (532.52 eV), respectively [27]. Another for Ti2p, two different peaks (458.79 eV, 464.63 eV) could be found in Figure 3(d), which can be suggested to the Ti4+ ion. Moreover, two small peaks indicate the existence of Ti3+ with lower binding energy of 459.5 eV and 463.86 eV [28]. Based on the pure rutile TiO2, the adulteration of In3+ ion can form oxygen vacancies for charge compensation. While the Ta element instead of the Ti element, some extra electrons are generated, transforming Ti4+ ions to Ti3+ ions, as follows:

(2)
Ti4+ + e → Ti3+ (3)
The \({\text{V}}_{\text{O}}^{{\bullet }{\bullet }}\) is the oxygen vacancy, the \(\text{T}{\text{a}}_{\text{Ti}}^{{\bullet }}\) represents Ta on the Ti lattice site, and the \(\text{I}{n}_{\text{Ti}}^{\text{'}}\) represents in on the Ti lattice site.
As discussed above, doping Ta5+ ions which create extra free electrons have a positive effect on transforming Ti4+ ions to Ti3+ ions, especially sintering in the N2 reducing atmosphere, the result of ultrahigh permittivity is obtained. Combining with In3+ ions, which are introduced to facilitate oxygen vacancies forming, keeping an electric neutrality of the system and forming different complex cluster-defects, including \({\text{I}\text{n}}_{2}^{3+}{\text{V}}_{\text{O}}^{{\bullet }{\bullet }}{\text{T}\text{i}}^{3+}\), \({\text{T}\text{a}}_{2}^{5+}{\text{T}\text{i}}^{3+}{A}_{\text{T}\text{i}} (A= {\text{I}\text{n}}^{3+}, {\text{T}\text{i}}^{4+}, {\text{T}\text{i}}^{3+})\) and so on. The moving of electrons is limited because of the various defect dipole clusters, further obtaining ultralow dielectric loss, the result is consistent with Fig. 2(a). Further in high temperature ranges, the result of ultrahigh permittivity could be related to the defect clusters are polarized. Although most of the defect clusters could not be activated at the lower temperature ranges, the localizable electrons could be polarized as well as move in a short distance, achieving an ultrahigh permittivity. As a result, the excellent dielectric properties and temperature stability should be closely connected to the localization of various complex cluster-defects, which could be originated from the EPDD.