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Ya-Chin King
National Tsing Hua University
Corresponding Author
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This work proposed a modified plasma induced charging recorder to widen detection range, for monitoring the possible plasma damage across a wafer during advanced CMOS BEOL processes. New antenna designs for plasma induced damage patterns with extended capacitance are investigated. By adapting the novel PID recorders, maximum charging levels of the detectors have been enhanced.
Keywords
plasma, CMOS, BEOL
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Peer Review Timeline
CURRENT STATUS: Under Review
Version 1
Posted 15 Dec, 2020
No community comments so far
Editorial decision: Major revision
On 04 May, 2021
Review #1 received
Received 08 Jan, 2021
Reviewer #1 agreed
On 20 Dec, 2020
Reviewers invited
Invitations sent on 19 Dec, 2020
Editor assigned
On 07 Dec, 2020
Submission checks complete
On 07 Dec, 2020
Editor invited
On 07 Dec, 2020
First submitted
On 06 Dec, 2020
Metrics
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PDF Downloads: ...
HTML Views: ...
Subject Areas
Electrical Engineering
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A new preprint design is coming!
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This preprint is under consideration at Nanoscale Research Letters. A preprint is a preliminary version of a manuscript that has not completed peer review at a journal. Research Square does not conduct peer review prior to posting preprints. The posting of a preprint on this server should not be interpreted as an endorsement of its validity or suitability for dissemination as established information or for guiding clinical practice.
Learn more about In Review
Nano Express
Ya-Chin King
National Tsing Hua University
Corresponding Author
Badges
Prescreen
This manuscript passed our Prescreen assessment
Complete author information
Appropriate declaration statements
Potential risks to human health
Prescreen
Peer Review Timeline
CURRENT STATUS: Under Review
Version 1
Posted 15 Dec, 2020
No community comments so far
Editorial decision: Major revision
On 04 May, 2021
Review #1 received
Received 08 Jan, 2021
Reviewer #1 agreed
On 20 Dec, 2020
Reviewers invited
Invitations sent on 19 Dec, 2020
Editor assigned
On 07 Dec, 2020
Submission checks complete
On 07 Dec, 2020
Editor invited
On 07 Dec, 2020
First submitted
On 06 Dec, 2020
Metrics
Comments: 0
PDF Downloads: ...
HTML Views: ...
Subject Areas
Electrical Engineering
License:
This work is licensed under a CC BY 4.0 License. Read Full License
This work proposed a modified plasma induced charging recorder to widen detection range, for monitoring the possible plasma damage across a wafer during advanced CMOS BEOL processes. New antenna designs for plasma induced damage patterns with extended capacitance are investigated. By adapting the novel PID recorders, maximum charging levels of the detectors have been enhanced.
Figure 1
Figure 2
Figure 3
Figure 4
Figure 5
Figure 6
Figure 7
Figure 8
Figure 9
The full text of this article is available to read as a PDF.
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