The F-gel confined growth of the SC wafer
As schematically shown in Fig. 1a, to achieve the soft contact of the F-gel-modified substrates, the perfluorosilane solution was coated on the surface of the glass substrate and then stored in humid ambient conditions for in situ cross-linking of R-Si-OH bonds to form thick films, in contrast to the self-assembly of perfluorosilane monolayers on the substrate, which has been widely used in conventional space-confined ITC crystal growth processes. The microscopic morphology as well as the thickness of the F-gel layer were characterized by scanning electron microscopy (SEM), as shown in Fig. 1b-d and Figure S1-S2, which show a micron-scale thick F-gel network layer formed on the substrate surface after modification, in contrast to the thin, smooth surface morphology of the self-assembled monolayer (SAM) on the reference substrate. Contact angle tests using water and γ-butyrolactone (GBL) liquid droplets on substrates with various treatments were also performed to characterize the hydrophobicity of the substrates. As shown in the inset of Fig. 1c-d and Figure S3, the F-gel treated substrates show larger contact angles of 117° and 93° for water and GBL solvent, respectively, compared to 90° and 62° for the those on the SAM substrates, which is beneficial for promoting the microcirculation of the precursor solution between gel-modified substrates during crystal growth that is important for wafer-scale single crystal growth.
We propose that compared to conventional hard contact SAM substrates (Fig. 1e), the flexible and smooth F-gel can eliminate the lattice mismatch between the crystal and substrate and alleviate the physical hindrance from the hard substrates during space-confined crystal growth (Fig. 1h). In addition, the low surface energy of perfluorinated molecular chains can suppress the chemical interaction and eliminate stress between the crystal and the substrate, therefore providing a growth environment close to an open system to facilitate large-size and high-quality crystal growth. As shown in Figs. 1f and 1i, the nucleation centers of the crystals on the F-gel substrate were substantially reduced compared to those on the SAM substrate, making it easier to grow large-sized single-crystal wafers with lateral sizes up to 4 cm with hundreds of microns thickness (Fig. 1g). We further summarize the size of the crystals grown on different substrates. As displayed in Fig. 1j, the F-gel substrates dramatically increased the average size of the crystal wafers by nearly 2.8 times, nearly 10 times in area, compared to that of the wafers grown with the SAM substrates, which verifies the effectiveness of this strategy in preparing large-sized perovskite SC wafers.
To assess the crystal quality of the as-grown SC wafers, which is especially important for radiation detection performance, we carried out NIR optical microscopy characterization on the crystals, which is able to visualize the macroscopic internal defects in opaque narrow band gap materials such as MAPbI3. Figure 2a shows the NIR transmission images of typical crystals grown on the F-gel substrate (F-gel-SC) and on the SAM substrate (SAM-SC). It is observed that the F-gel-grown SCs always show clear crystal transparency with high uniformity under NIR imaging, in strong contrast to the poor transparency and large amount of macroscopic defects in those grown on SAM substrates (SAM-SC1). These defects are mainly located on the surface of the crystals, since they can be removed after polishing the crystal surface (SAM-SC2), which results in a high transparency to NIR light similar to the F-gel-grown crystal. However, there was still a significant difference in the domain distribution observed in the SCs when we further added polarizers in the imaging system with various polarization angles. It is shown in the polarized optical microscope images in Figs. 2b and 2c that the crystals grown on the hard contact substrate have interlaced domains with different brightnesses inside the crystals (SAM-SC1 and SAM-SC2), which are known as ferroelastic domains with different orientations that are usually generated under large external stress,25 while the crystals grown on the soft contact interface possess a unidirectional domain distribution without any domain boundaries (as in the F-gel-SC in Fig. 2b-c). To further verify the domain distribution in the crystals observed in the polarized optical microscope, we etched the surface of the crystals grown on different substrates by soaking the crystals in acetone for approximately 2 min to directly expose the domains in the crystal.26 As shown in Fig. 2d, domains with interlaced orientations can be clearly observed in the crystals grown on SAM substrates after etching, in good accordance with the two domain orientations in the polarized NIR images. For soft contact-grown crystals, a periodic ordered domain with a unitary orientation was observed on the surface after etching (Fig. 2e), which also matches well with the polarized NIR imaging results. This result indicates that the external stress from the hard substrate is dramatically relieved by the soft F-gel layer during the space-confined crystal growth process, which not only prevents the mechanical deformations of the SCs and hence suppresses defect formation on the crystal surface but also improves the domain orientation uniformity in the crystal interior over a large scale. As a result, the crystals can be simultaneously prepared with both fast growth speed and high crystal quality on the F-gel substrates, which also enables the direct solution-processed growth of SC wafers instead of cutting and polishing them from large ingots that are always required in wafer fabrication of other crystals, such as CZT or silicon.
The crystalline quality of the SCs was further evaluated by X-ray diffraction (XRD) measurements. As shown in Fig. 3a and Figure S4, both kinds of SCs exhibit sharp diffraction peaks with (200) and (400) orientations. The high-resolution X-ray rocking curves of the (200) and (400) peaks of the two kinds of SCs are shown in Fig. 3b, which exhibited very narrow FWHMs of only 84.96 arcsec and 74.42 arcsec for the F-gel-SC, respectively, in contrast to 300.06 arcsec and 171.72 arcsec for the SAM-SC, further confirming the excellent quality of our monocrystalline wafers offering the potential to achieve excellent radiation detection performance.
The superior crystallinity and uniformity of the F-gel-grown crystals compared to the SAM-grown crystals are expected to dramatically improve their overall charge transport properties, which was assessed by measuring the carrier mobility and trap density change of the SCs with the space-charge-limited-current (SCLC) method (Fig. 3c and 3d). The device configurations for the SCLC measurements are Cu/bathocuproine (BCP)/C60/MAPbI3 SC/C60/BCP/Cu and Au/MAPbI3 SC/Au for electron- and hole-only devices, respectively. The trap density (nt) can be determined from the formula27:
$${\text{V}}_{\text{TFL}}\text{=}\frac{\text{e}{\text{n}}_{\text{t}}{\text{L}}^{\text{2}}}{\text{2}\text{ε}{\text{ε}}_{\text{0}}}$$
where ε and ε0 are the relative dielectric constant of MAPbI3 and the vacuum permittivity, respectively; e is the elementary charge; and L is the thickness of the single crystal. For F-gel-SC, the electron and hole trap densities were calculated to be 2.18×1010 cm− 3 and 3.06×1010 cm− 3, respectively, which are 3.3 times lower than those of SAM-SCs (electron trap density: 7.13×1010 cm− 3, hole trap density: 9.44×1010 cm− 3). The defect density of the crystals is comparable to that of silicon single crystals grown by Czochralski method with multiple high-temperature melting processes. Meanwhile, the electron and hole mobilities (µ) of the crystals were derived from the Mott-Gurney Law6:
$${\text{J}}_{\text{D}}\text{=}\frac{\text{9}\text{ε}{\text{ε}}_{\text{0}}\text{μ}{\text{V}}^{\text{2}}}{\text{8}{\text{L}}^{\text{3}}}$$
where JD is the current density and V is the bias voltage. The electron and hole mobilities of the SCs also dramatically increased from 32.07 cm2 V− 1 s− 1 to 110.90 cm2 V− 1 s− 1 and from 42.11 cm2 V− 1 s− 1 to 97.15 cm2 V− 1 s− 1, respectively, with the adoption of F-gel substrates. Notably, the MAPbI3 SCs exhibit balanced electron and hole mobilities, which is beneficial for efficient charge carrier collection during the radiation detection process. We further measured the mobility-lifetime (µτ) product of the SCs with the steady-state photocurrent method, which is the key quantity of merit to evaluate the charge collection capabilities of radiation detection materials. The µτ product is obtained by fitting the photocurrent-voltage curve (Fig. 3e-f) by the Hecht Eq. 18,28:
$$\text{I=}\frac{{\text{I}}_{\text{0}}\text{μτV}}{{\text{L}}^{\text{2}}}\text{(1-exp(-}\frac{{\text{L}}^{\text{2}}}{\text{μτV}}\text{))}$$
where I0 is the saturated photocurrent and V is the applied bias. Benefiting from the increased carrier mobility and suppressed trap density, the F-gel-SC possess a higher µτ product of 1.09×10− 2 cm2 V− 1, which is ~ 10 times larger than those of the SAM-SC and is also one of the highest reported values for MAPbI3 SCs grown by the ITC method to the best of our knowledge. All the above results indicate that the F-gel confined crystal growth method is effective in the fabrication of detector-grade OIHP single-crystal wafers with both high crystalline quality and superior electrical transport properties.
Radiation Detection Performance Of The SC Devices
With the outstanding electrical properties of the F-gel- SCs, we prepared radiation detectors based on them with a metal-semiconductor-metal (MSM) coplanar device architecture, which has been proved to possess both high X-ray sensitivity and low working bias.29 The crystal surface was covered with a thin aminosilane layer before Au electrode deposition to inhibit the interfacial electrochemical reaction, as we reported previously.22 After electrode deposition, the devices were encapsulated by cover glass and attached to a printed circuit board (PCB) substrate for bonding and wire connection (Fig. 4a). Finally, the Pb mask was attached to the device to define the effective working area, and black tape was wrapped on top to shield the device from the influence of environmental light.
We first examined the X-ray response of the devices under an X-ray source with energy up to 50 keV. Figure 4b and Figure S5 show that both the F-gel-SC-based detectors (F-gel-detectors) and the SAM-SC-based detectors (SAM-detectors) achieve an excellent current response of approximately 10 µA cm− 2 under a dose rate of 25 µGyair s− 1 at a 5 V bias, indicating that both possess extremely high X-ray responsivity. Furthermore, the X-ray photocurrent density of the F-gel SC devices under a 5 V bias was measured with gradually decreasing incident dose rate (Fig. 4c), and the device sensitivity was derived from the slope of the dose-rate-dependent photocurrent curve in Fig. 4d. F-gel-detectors exhibited a large average sensitivity of 3.0×105 µC Gy-1 air cm− 2, which remarkably outperforms benchmark commercial detectors such as CZT and is also among the highest reported values for perovskite-based radiation detectors.
Dark current suppression and stabilization are as important as signal enhancement in gamma ray spectroscopy. We measured the dark current of the F-gel-detectors with that of the SAM-detectors at a 5 V bias, and the representative I-V curves are shown in Figure S6a. As summarized in Fig. 4f, the average dark current of F-gel-detectors is 0.90 nA, in contrast to 3.04 nA for the SAM-detectors. As a result, the average resistance of the F-gel-detectors is as high as 7.54 GΩ, which is nearly 5 times larger than that of the SAM-detectors (1.67 GΩ). Such an obvious difference is mainly caused by the lower trap density in the F-gel SC that suppressed the background self-doping concentration. The improved crystal quality of the F-gel SC also suppressed the ionic defect-induced ion migration channels, which led to better biasing stability. As shown in Fig. 5b and Figure S7, the devices based on F-gel-SCs exhibit an ultralow baseline drift of 4.0×10− 8 nA cm− 1 s− 1 V− 1 under a large electric field of 1000 V cm− 1, which is among the best biasing stabilities reported for three-dimensional OIHP SCs and even approaches those of zero-dimensional ones, while the sensitivity is more than 2 orders of magnitude larger than them (Fig. 5c and Table 1).9,23,30−35 In addition, after successively switching on and off of the X-ray irradiation, the change rate of dark current was 28% for F-gel-detectors after 5 cycles, which is 10 times smaller than the that of the SAM-detector (Fig. 4g). Benefiting from the high sensitivity, low dark current and excellent biasing stability, F-gel-detectors are able to distinguish the weak signal from noise under an ultralow X-ray dose rate of 2.5 nGyair s− 1 with a signal-to-noise ratio (SNR) of 4.6 (Fig. 4e), which is especially desirable for gamma-ray detection in view of the very low photon flux of approximately 104 counts s− 1 cm− 2 for common gamma-ray sources.17 In addition, the detectors also demonstrate a fast response speed with a rise time of 7.9 µs and fall time of 13.1 µs (Figure S8), which is fast enough to perform event-by-event analysis in pulse detection mode of common gamma-ray spectroscopy. The encapsulated device exhibited excellent storage stability, with the photocurrent response remaining almost constant after 7 months of storage in the atmosphere (Fig. 5a). We have also traced the irradiation stability of the devices, which exhibited even higher photocurrent response after a continuous radiation exposure of about 32.4 mGy (Figure S6b). Overall, the optimal radiation detectors demonstrate high sensitivity, large resistivity, low noise, excellent biasing stability and fast response speeds that are difficult to achieve simultaneously in solution-processed radiation detectors thus far, suggesting their bright prospects for high-resolution gamma-ray spectroscopy applications.
Table 1
Dark current drift for part of the reported perovskite-based X-ray or γ-ray detectors.
Materials
|
Time (h)
|
Sensitivity
(µC Gy-1 air cm− 2)
|
Dark current drift
(nA cm− 1 s− 1 V− 1)
|
Reference
|
3D MAPbI3 single crystal
|
~ 1
|
2.6×106
|
1.2×10− 5
|
23
|
3D BiOBr-Cs2AgBiBr6
polycrystalline wafer
|
~ 0.1
|
250
|
7.4×10− 5
|
35
|
3D MAPbBr3 single crystal/Si integration
|
---
|
2.1×104
|
1.2×10− 3
|
9
|
3D MAPbI3 single crystal
|
~ 17.5
|
---
|
2.0×10− 3
|
30
|
2D (PEA)2PbI4 single crystal
|
~ 23
|
---
|
1.9×10− 7
|
0D MA3Bi2I9 single crystal
|
~ 24
|
1947
|
5.0×10− 10
|
2D (PEA)2PbI4 single crystal
|
~ 25
|
848
|
3.25×10− 7
|
31
|
2D (o-F-PEA)2PbI4 single crystal
|
~ 25
|
1724.5
|
8.48×10− 8
|
2D Rb3Bi2I9 single crystal
|
~ 0.5
|
159.7
|
1.82×10− 7
|
32
|
2D (BDA)PbI4 single crystal
|
~ 14
|
242
|
6.06×10− 9
|
33
|
2D (F-PEA)2PbI4 single crystal
|
~ 2
|
3402
|
4.9×10− 8
|
34
|
3D MAPbI3 single crystal
|
~ 15
|
3.0×105
|
4.0×10− 8
|
This work
|
Gamma-ray Spectroscopy
In contrast to the charge integration mode used for X-ray detection, the pulse operation mode is generally required for gamma-ray spectrum acquisition to differentiate a single photon event under very low incident flux and hence to obtain the intensity versus energy statistics of the radiation source. As a result, a large SNR is crucial for efficient and high ER gamma-ray spectroscopy. The 241Am gamma-ray source was used to evaluate the SNR of the devices in gamma-ray spectroscopy. The output signals from the preamplifier of the F-gel-detectors and SAM-detectors are recorded under gamma-ray irradiation, which shows a larger SNR of 17.8 for the F-gel-detectors, in contrast to the small SNR of 5.0 for the SAM-detectors (Fig. 6a-b). As a result, the noise-induced peak broadening and tailing of the energy spectrum can be greatly suppressed with F-gel-detectors, which leads to better ER.
To confirm this, the energy spectrum measurement is carried out utilizing a 152Eu gamma-ray source at room temperature and atmospheric conditions with a bias of 5 V and a forming time of 200 seconds. As shown in Fig. 6c, the signal peaks in the energy spectrum are sharp and distinct. Even Kα and Kβ peaks of Sm are clearly visible between 30 and 50 keV for the F-gel-detectors, and the ER is calculated to be 7.4% for the characteristic peak of 39.8 keV. For the SAM-detectors, the 39.8 keV peak is merged into the noise-induced low-energy tailing that can hardly be distinguished, which leads to a poor ER of 12.7%. We also evaluated the influence of the working bias of the devices on the measured energy spectrum. As shown in Fig. 6d, a substantially higher peak intensity of 39.8 keV and better ER are achieved when increasing the bias voltage due to the more efficient collection of photon-generated charge carriers. The increase in the channel number of the peak tends to saturate with increasing bias up to 10 V, suggesting that full charge collection can be achieved even under such a small bias in our coplanar structured detectors, in contrast to sandwich structured commercial CZT detectors, which usually require hundreds to thousands of volts to work. The ultralow working bias of the detectors not only reduces the energy consumption and expenses but also enhances the portability and safety of the detection system.
Finally, we measured the 241Am source energy spectrum with the optimal F-gel-detector. As shown in Fig. 6e, a record resolution of 4.9% for the 59.5 keV peak was achieved under 5 V bias, which is the highest value for MHP-based gamma detectors at the same energy range as well as for solution-processed semiconductor gamma-ray detectors ever reported (Fig. 5d),17–20,36−40 and even approaches that of commercial CZT detectors. The excellent ER is mainly attributed to the lower dark current, larger resistance, and better SNR of the F-gel-detectors compared to the SAM-detectors (Fig. 5e), which further verified the effectiveness of F-gel in the preparation of detector-grade high-quality OIHP SCs.