X-ray diffraction (XRD)
Figure 1 shows the diffractograms of the films. Three diffraction peaks were observed at 2θ= 10.1°, 20.1° and 21.8°, corresponding to the crystallographic planes (002), (101) and (220) of chitosan, respectively [31, 32].The XRD peaks at 2θ= 10.1° is attributed to the hydrated crystallite structure of chitosan due to the integration of water molecules in the crystal lattice whereas the peak at 2θ= 20.1° is associated with the regular chitosan crystal lattice. The diffraction peak at 2θ= 22° corresponds to the amorphous structure of the chitosan. The appearance of diffraction peak related to the amorphous nature of chitosan indicate that the crosslinking of glycerol and GPTEOS to the chitosan polymeric network are strong enough to change the crystal structure of the chitosan [33, 34, 37. The XRD diffraction peak of amorphous silica can be observed at 2θ= 22° as well [38].
Attenuated Total Reflectance Fourier Transform Infrared Spectroscopy (ATR-FTIR)
The ATR-FTIR spectra of the films are shown in Fig. 2. The peak at 1016 cm-1 corresponds to the symmetric stretching of the C-O-C bond. The peak at 1075 cm-1 is attributed to the skeletal vibration of C-O and is usually assigned as the fingerprint peak for the chitosan structure. The IR peak is at 1554 cm-1 is attributed to the N-H bending vibration and C-N stretching vibration in the region of amide II [30, 39], whereas the second peak at 1645 cm-1 is associated with the C-O stretching of amide I [39, 40]. The peak at 1384 cm-1 and a shoulder at 1317 cm-1 correspond to asymmetric С-О-С stretching vibrations and С-О stretching vibration of СН-ОН. The asymmetric and symmetric stretching vibrations of NH bond is reflected though the presence of IR band around 3000-3500 cm-1 [39]. The peak at the region can also be attributed to the stretching vibration of SiO–H bond and adsorbed water (HO-H) on the silica surface [41]. The band appears to be more intense and broader in CH/SiO2/Gly indicating an abundance in OH concentration compared to CHT/SiO2/GPTEOS. This observation could also indicate that crosslinking in CHT/SiO2/GPTEOS took place through silanol groups. The peak around 1000-1100 cm-1 can also be associated with the Si-O-Si bond [42]. In the FTIR spectrum of CHT/SiO2/Gly , the bending of the C-O-H can be observed in the region at 1416 cm-1 whereas the peak associated to C-O stretching of the primary alcohol is visible at 1162 cm-1. The peak at 1362 cm-1 is attributed to C-H vibration of the glycerol [41].
The crosslinking between chitosan and silica can take place when the silanol group of the silica reacted with the hydroxyl groups of the chitosan through condensation reaction to form Si-O-C bond (indicated in red line). The IR peak related to Si-O-C bond is normally can be seen around 1252 cm-1 [42]. However, it is difficult to distinguish due to the overlapping of different band structures. The schematic representation of the crosslinking is shown in Scheme 1.
Similarly, the glycerol can react with the silanol group of the silica and the hydroxyl group of the chitosan group through condensation to form the framework of CHT/SiO2/Gly. The reaction is shown in Scheme 2.
The FTIR peaks of epoxy and ethoxy which could be observed generally around 1074 cm-1 and 2852 cm-1, respectively could not be observed in the FTIR spectrum of CHT/SiO2/GPTEOS. The disappearance indicate that the crosslinking has taken place through the components. The GPTEOS can be hydrolysed by water to organosilicon compound (A) and the removal of ethoxy group as C2H5OH. The reaction scheme is shown in Scheme 3 (a).
The compound can react with the hydroxyl group of the silanol through condensation reaction to form organosilicon compound (B). The epoxy ring of (B) can cleave and react with the amine of the chitosan to form the CHT/SiO2/GPTEOS as shown in Scheme 3 (b), in addition to the reaction between the amine and epoxide, silanol groups of silica can also react with the remaining hydroxy of the chitosan. The peaks associated to the OH and NH2 at 2900 cm-1 reduced significantly compared to other composite films indicating utilization of these functional groups in the formation of the composite film.
Scanning Electron Microscopy -Energy Dispersive X-Ray (SEM-EDX)
Figure 3 shows the SEM images of CHT/SiO2/Gly and CHT/SiO2/GPTEOS. The surface of CHT/SiO2/Gly (Fig. 3(a)) and CHT/SiO2/GPTEOS (Fig. 3(b)) appears to be highly uneven. The addition of Gly and GPTEOS among others can improve the flexibility and extendibility of a polymer. These properties are obtained by weakening or even breaking the intermolecular bonds. The weakening of the bonds could possibly can the arrangements of the polymeric chain and cause the film to shrink during the drying process. The cross section of CHT/SiO2/Gly (Fig. 3(c)) appears to have microcracks and voids. The FTIR analysis of CHT/SiO2/Gly indicate the presence of abundant amount of OH bonds which can form hydrogen bonding within the polymeric chain. The hydrogen bonding can induce anti-plasticizing effect to form tighter polymeric network. As a result of this effect, tighter polymeric network can cause micro-cracking on the surface [43]. The voids and microcracks can be seen in the cross-section image of CHT/SiO2/Gly. The microcracks and void were not prominent in the cross section of CHT/SiO2/GPTEOS (Fig. 3(d)) due to the lack of OH bond to induce the anti-plasticizing effect but the film has a dense structure.
Wettability test
Wettability test measures the level of wetting when solid and liquid phases interact with each other. The wettability of CHT/SiO2/Gly and CHT/SiO2/GPTEOS is determined by measuring the contact angle between the films and water droplet. Greater wettability is signified if the contact angle is ≤ 90° whereas contact angle ≥ 90°indicate lower wettability [44]. As shown in Fig. 4, CHT/SiO2/Gly (58.28 o ± 0.03º) has lower contact angle compared to CHT/SiO2/GPTEOS (84.92 ± 0.05º). This observation can be explained based on FTIR analysis. The analysis showed that CH/SiO2/Gly has higher amount of OH group which allows water to form hydrogen bond with the film’s surface. The contact angle CHT/SiO2/GPTEOS is higher due to the lack of OH bond to form hydrogen bond with the water molecules.
Film thickness and swelling index of the films
Blending chitosan matrix with other component often increases the film’s thickness. However, in this research, the thickness of the films did not change significantly as shown in Table 1. The presence of silicate species with the chitosan framework causes the tighter binding and the structure of the film becomes more compact [45]. In addition, due to the glycerol hydrodynamic radius [46], the glycerol molecules tend to increase the spacing between the chitosan macromolecules located in each layer instead of separating them. Plasticiser molecules surrounding the polymer molecules interact by hydrogen bonds at specific sites (-OH, -NH2), suppressing the film from having greater thickness. The crosslinking in CHT/SiO2/GPTEOS is higher causing the layers of chitosan macromolecules to be closer,
The swelling index of the films is presented in Table 1 as well. It can be seen that the CHT/SiO2/Gly has a higher swelling index compared to CHT/SiO2/GPTEOS. This is possible since the film has plenty of functional groups such -OH and -NH2 which can form hydrogen bonds with water molecules [47]. These functional groups increase the film's swelling [48,49]. The GPTEOS is a well-known hydrophobic organosilane. Hence, it is expected for the swelling index to be lower than the rest of the films.
Table 1 The obtained film thickness, density and swelling index of the film.
Film sample
|
Thickness (mm)
|
Swelling index (%)
|
CHT/SiO2/Gly
|
0.366 ± 0.04
|
60.03 ± 1.09
|
CHT/SiO2/GPTEOS
|
0.367 ± 0.02
|
45.53 ± 1.17
|
*The values were expressed in mean± standard deviation with significant difference (p<0.05)
Point of zero charge (PZC) refers to the pH values at which the surface charge components become equal to zero under given conditions of temperature, applied pressure, and aqueous solution composition [50]. However this does not mean the surface is free from any charges, it means the surface positive charge is equal to the negative charge [51]. The pHpzc of CHT/SiO2/Gly and CHT/SiO2/GPTEOS was calculated to be 4.39 and 4.27, respectively (Fig. 5).
Mitigation of Alexandrium minutum
The removal efficiency (RE) of the film is shown in Fig. 6. The RE values were observed to fluctuate for the first three hours (RE= 18.1 ± 9.81-25.9 ± 10.16 %) and during this period the films were observed to start to swell. It is postulated that during the swelling stage, the algae cells that were initially trapped within the framework of the films escaped. The CHT/SiO2/GPTEOS recorded least changes at this period due to its low swelling index. The RE value started to increase rapidly from the 10th h to 20th h, then started to drop and fluctuate until the end of the experiment. The removal of Alexandium minutum at 72 h was 26.57 ± 10.81% using CHT/SiO2/Gly and 50.06 ± 11.90% using CHT/SiO2/GPTEOS. The statistical analysis revealed significant differences between each film tested (p<0.05).
The pH of culture increased slightly from 6.61 to 6.69 in the presence of the films. Since the pH is within the normal range for aquatic animals, it indicates that the algae died from the attachment on the films, not because of the change in pH.
The RE value of CHT/SiO2/Gly and CHT/SiO2/GPTEOS was noticed to be lower compared with published silica- based HABs mitigation agents as shown in Table 2. Only a few publications can be found on regarding the utilization of silica as HABs mitigating agent. Two factors can be attributed to this observation. 1) The films continued to swell throughout the mitigation studies. Hence, the initially absorbed algae cells were able to escape. 2) The pHPZC of the films is lower compared to pH of the culture. Hence, the surface of the films will be negatively charged. Since the algae is negatively charged as well, the electrostatic repulsion will overcome the electrostatic attraction. As a result, the number of collisions between the algae and the films for maximum removal will be reduced. This conditions can lead to lower RE value. The capture and release mechanism of the algae cells by the CHT/SiO2/Gly and CHT/SiO2/GPTEOS is simplified in Fig. 7.
Table 2 Removal efficiency of different types of algae using silica-based mitigating agents.
Mitigating agent
|
HAB species
|
Removal Efficiency
|
Reference
|
Silica-modified QAC (Fixed-Quat) and applied to a fiberglass mesh
|
Microcystis aeruginosa
|
99% inactivation after 10 hr of exposure.
|
[24]
|
Local beach sand or silica sand modified with chitosan and polyaluminum chloride (PAC).
|
Amphidinium carterae Hulburt and Chlorella sp.
|
80% within 3 min of exposure
|
[21]
|
Xanthane and calcium ydroxide modified clays, soils, and sands)
|
Amphidinium carterae
|
83–89% within 30 min of exposure
|
[22]
|
Modified soil using amphoteric starch (AS) and poly-aluminium chloride (PAC)
|
Microcystis aeruginosa and marine Chlorella sp.
|
99.9% removal efficiency within 5-250 min of exposure.
|
[23]
|
Digital microscopy analysis of the films after mitigation
The used films were analysed with digital microscopy. The digital microscopic images showed that the algae cells attached to the CHT/SiO2/Gly ruptured (Fig 8(a)), whereas the algae cells on the CHT/SiO2/GPTEOS film remained intact. Since NH2 group of chitosan is preserved in CH/SiO2/ Gly, the positively charged amine groups in the chitosan structure could induce stress to the algal cells and promotes cell rupturing [21, 52]. Whereas in CHT/SiO2/GPTEOS film, most of the NH2 of chitosan is used up during the crosslinking process, hence further reducing the electrostatic charge and prevented the algae cells from rupturing.
SEM analysis of the films after mitigation
The used films were subjected to SEM analysis to observe any changes on their morphology. As can be seen in Fig. 9(a), a lump of mass possibly the ruptured algae cells can be observed on the surface of CHT/SiO2/Gly whereas on the surface of CH/SiO2/GPTEOS, irregularly rectangle shaped particles can be seen. Algae cells has various type of functional groups such as -OH and NH2 which can react with the films’ framework through hydrogen bonding [53]. During the drying process, the structure of the algae could have changed due to the removal of water and bonding. Further investigation is being carried out to understand the cause of the morphological changes.
Biodegradation of the used films in the soil
Chitosan has been used extensively due to its biocompatibility and biodegradability properties. The biodegradable behaviour of the used films in the soil were observed for one month by taking the pictures and recording the weight loss. The physical changes of the buried films were shown using the red circle in Fig. 10. The films became brittle and started to lose their shape and break into pieces after being buried for 7 days. The films were degraded completely at the end of 28th day where no traces of films were found in the soil. All the films exhibit good biodegradable properties as it is totally degraded after being buried for 30 days. The rapid degradation and faster disappearance by the films in the soil adds an advantage to dispose of the used films safely without creating pollution to the aquatic environment.