A. OES emission spectra
Figure 2 shows the emission lines with their electron excitation energy thresholds of an argon RF discharge. The OES was set outside the discharge tube and was facing the centerline of the tube. Wavelengths of emission lines and their excitation energies were compared with the NIST Atomic Spectra Database Lines in order to meet the international standards (https://physics.nist.gov/PhysRefData/ASD/lines_form.html).
As shown in Fig. 2, all the emission lines with wavelengths ranging from 200 nm to 1100 nm were divided into two different regions by their different excitation energy thresholds. Firstly, the emission lines with wavelengths ranging from 200 nm to 600 nm are mainly high-energy electron excited ionic (Ar II) lines (≥ 19 eV). Meanwhile, the emission lines with wavelengths ranging from 600 nm to 1100 nm are mainly low-energy electron excited neutral lines (Ar I) lines (mainly 13–15 eV). Four lines with the highest signal-to-noise-ratio (SNR) in one emission spectrum were used to establish a comparison with different working conditions. These are 434.8 nm, 480.6 nm, 763.5 nm, and 811.5 nm lines. The lines of 434.8 nm and 480.6 nm are high-energy electron excited ionic lines. The lines of 763.5 nm and 811.5 nm are low-energy electron excited neutral lines. Their spectra details are listed in Tables 1, in which wavelengths, ion types, transition probabilities (Aki), statistical weights (gk), excited energy levels (Ei, Ek), and the electron configurations of the emission lines have been included.
Table 1
Spectra details of the 434.8 nm, 480.6 nm, 763.5 nm, and 811.5 nm lines.
No.
|
Ion
|
Wavelength
(nm)
|
Akigk
(108 s–1)
|
Ei
(eV)
|
Ek
(eV)
|
Lower level
(conf., Term, J)
|
Upper level
(conf., Term, J)
|
1
|
Ar II
|
434.8
|
9.36
|
16.644
|
19.494
|
3s23p4(3P)4s, 4P, 5/2
|
3s23p4(3p)4p, 4D0,7/2
|
2
|
Ar II
|
480.6
|
4.68
|
16.644
|
19.223
|
3s23p4(3P)4s, 4P, 5/2
|
3s23p4(3p)4p, 4P0,5/2
|
3
|
Ar I
|
763.5
|
1.23
|
11.548
|
13.172
|
3s23p5(2P03/2)4s, 2[3/2]0, 2
|
3s23p5(2P03/2)4p, 2[3/2], 2
|
4
|
Ar I
|
811.5
|
2.30
|
11.548
|
13.075
|
3s23p5(2P03/2)4s, 2[3/2]0, 2
|
3s23p5(2P03/2)4p, 2[5/2], 3
|
B. Different intensity jumps of ionic and neutral lines
Figure 3 shows the emission spectra with different input RF powers (200–1200 W) under different magnetic field strengths. Figure 3 (a) shows the emission spectra with a central magnetic field strength of 800 G. Figure 3 (b) shows the emission spectra with a central magnetic field strength of 1000 G. From these figures, we can see that the intensity growth rate of the high-energy electron excited ionic population (434.8 nm and 480.6 nm lines) is larger than that of the low-energy electron excited neutral population (763.5 nm and 811.5 nm lines) with the increase of input powers. This phenomenon is more obvious with 1000 G condition. The intensity of the ionic population is higher than the neutral population at 1000 W and 1200W.
Figure 4 shows the emission intensity variations with different input powers of the 434.8 nm, 480.6 nm, 763.5 nm, and 811.5 nm lines under different magnetic field conditions (800G, 1000G, and 1200G). Figure 5 shows the normalized emission intensities of these four lines. These values are normalized by taking the data of 200 W as reference. The results show that the low-energy electron excited neutral populations (763.5 nm and 811.5 nm lines) jump at 400 W and reach the helicon wave mode, and then become to a nearly saturation level. However, the high-energy electron excited ionic populations (434.8 nm and 480.6 nm lines) jump firstly at 400 W and reach a wave mode (W1 mode). After that, they jump for the second or/and the third time (W2 or W3 mode). Instead of reach to a saturation level, their intensity increase almost linearly with the increasing input power. Moreover, the applied magnetic field strengths have an important influence on their relative emission intensity. The relative intensities of the low-energy electron excited neutral lines (763.5 nm and 811.5 nm lines) decrease significantly with the increase of magnetic field strengths, while that of the high-energy electron excited ionic lines (434.8 nm and 480.6 nm lines) increase slightly with the increase of magnetic field strengths.
C. ICCD images with different filters
1. Energy coupling with different RF input powers
From the above emission spectra, it can be seen that there are mainly two different particles in the Helicon discharge plasma. These are the high-energy electron excited ionic lines (434.8 nm and 480.6 nm) and the low-energy electron excited neutral lines (763.5 nm and 811.5 nm). Moreover, these two parts show different intensity jumps with the increase of RF input power. This phenomenon may allow us to have a deeper understanding of the energy coupling between RF input power and plasma. In order to distinguish these two different particles, two different filters (480 nm band pass and 600 nm high pass) were used for ICCD imaging experiments. Originally, 810 nm band pass filter was intended to be used, but there was large fringe noise in the image. Finally, the 600 nm high pass filter was used for a high-quality image.
Figure 6 shows the spatial structure of the high-energy electron excited ionic and low-energy electron excited neutral particles with different RF input powers. For high-energy electron excited ionic particles (480 nm band pass), they are firstly generated at both ends of the antenna and their radial distribution is relatively uniform, see the 200-W case. With the increase of input powers (300 W), they expand to the middle of the antenna to form an axial particle path. After the wave mode has been reached (500 W), their axial intensity distribution is asymmetric. The maximum axial intensity locates at one end of the antenna. In addition, their radial distribution concentrates towards the center dramatically, and the maximum radial intensity locates on the central axis of the discharge tube.
As for the low-energy electron excited neutral particles (600 nm high pass), they are also firstly generated at both ends of the antenna. They expand to the middle of the antenna to form an axial particle path with the increase of input powers. After the wave mode has been reached, the axial particle path is formed. But the higher axial intensities locate at both ends of the antenna. The radial distribution concentrates towards the center slightly.
2. Plume plasma properties
Figure 7 shows plume plasma structure of the ionic (480 nm band pass) and neutral particles (600 nm high pass) with different RF input powers. The results show that the high-energy electron excited ionic particles are highly directional compared with that of the low-energy electron excited neutral particles. The ionic particles could reach longer axial distances than the neutral ones.
3. Reversed magnetic field
Figure 8 shows the effects of reversed magnetic field on the plasma structure. Both the intensity distributions of the high-energy electron excited ionic and low-energy electron excited neutral particles are axially reversed. Moreover, the radial intensity distributions are more concentrate towards the centerline with the negative magnetic field.