The expression of EPS-related genes under thermal stress
The effect of high-temperature stresses (42 and 47oC) on the expression of EPS-related gene in L. plantarum VAL6 was investigated via RNA sequencing. Through analysis and comparison of the gene expression profile of the stressed L. plantarum VAL6 and the control (37oC), we found that cps4F, cps4E and cps4J genes were significantly (p < 0.05) upregulated in response to thermal stress. Also, the exposure time played an important role in the regulation of these genes (Fig. 1).
The expression level of cps4E (Fig. 1d) peaked at 5 h after thermal stress with 13.4 and 38.1-fold under 42 and 47oC treatments, respectively. Similar to cps4E, the highest expression level at the same time of cps4F (Fig. 1c) was 27.6-fold under 42oC treatment and 32.8-fold under 47oC treatment. However, the expression levels of two genes decreased after exposure to thermal stress for 7 h. Meanwhile, the expression level of cps4J was steadily increased over time of stress and reached more than 18-fold after 7 h of treatment (Fig. 1e).
The expression of EPS-related genes under acid or alkaline stress
In order to survive and adapt to acid or alkaline stress, microorganisms have developed complex mechanisms at physiological and molecular levels (Guan and Liu 2020). In this work, the response of L. plantarum VAL6 to acid or alkaline stress via the transcriptional analysis of EPS-related genes was also studied. The results disclosed that cps4H was significantly (p < 0.05) upregulated in exposure to acid at pH 3. Meanwhile, cps4F and cps4E were significantly (p < 0.05) upregulated in response to alkaline stress condition (Fig. 2).
Under stress at pH 3, there was a great increase in the expression level of cps4H (~ 4-fold) (Fig. 2f), but the expression levels of glmU, pgmB1 and cps4E decreased (Fig. 2a, Fig. 2b and Fig. 2e). In the case of stress at pH 8, the expression level of cps4F increased steadily from 2-fold at 1 h to 3.3-fold at 7 h (Fig. 2c). As a similar pattern with cps4F, the expression level of cps4E was also rose gradually from 2.8 to 3.9-fold during the time of stress (Fig. 2d).
The expression of EPS-related genes under NaCl stress
The alteration in gene expression under osmotic stress is also to adjust cellular metabolisms (Le Marrec 2011). Therefore, it is important to consider transcriptional regulation in exposure to osmotic stress. In this study, we also investigated the effect of the addition of NaCl at different concentrations on the expression of genes involved in EPS synthesis in L. plantarum VAL6. The overall results indicated that the expression of glmU, pgmB1, cps4J and cps4H genes were significantly (p < 0.05) downregulated in exposure to NaCl at 7–10% concentrations (Fig. 3).
In addition, an increase in the expression level of cps4F was detected (~ 1.2-fold) at 1 h of 10%-NaCl treatment and at 5 h of 4%-NaCl treatment (Fig. 3c). Similarly, cps4E was upregulated by 1.3 and 1.4-fold at 1 h of 10%-NaCl treatment and at 5 h of 4%-NaCl treatment, respectively (Fig. 3d).
The expression of EPS-related genes under CO2 intensification culture
Unlike other stress treatments, CO2 intensification culture increased the expression of all tested genes between 1.2 and 3-fold. Furthermore, with the exception of cps4E, the other genes were upregulated with increasing time of CO2 supplementation (Fig. 4). The highest expression level of cps4E was 1.8-fold upon exposure to 8-hour CO2 treatment, while its expression returned to 1.5-fold upon exposure to 24-hour CO2 treatment (Fig. 4d).